Time: 9 March 2023, 2 p.m.
Sites: Multi-function Hall 502, New Optoelectronics Building, Shanghai Institute of Technology (East side of the building)
Title: High Power Deep UV (Vacuum UV) Solid State Lasers
Abstract: High-power, high-coherence 193nm lasers have important applications in interferometric lithography and laser processing. Using a high-coherence solid-state laser, which is injected as a seed into an ArF excimer laser amplifier, high power and high coherence can be obtained at the same time at 193nm wavelength. In the presentation, the results of the research and application of high average power 193nm solid-state laser and ArF excimer laser amplification will be presented, as well as a brief introduction to the deep ultraviolet to mid-infrared lasers for accelerator applications, which were developed with the participation of the researchers.
Rapporteur's profile
Hongwen Xuan is a researcher, Master's supervisor of University of Chinese Academy of Sciences (UCAS), introduced talent of Hundred Talents Programme of Chinese Academy of Sciences (CAS), and group leader of Guangdong Great Bay Region Institute of Space and Astronautical Information (GBAI). He graduated from Shandong University, majoring in Optical Information Science and Technology (2006), and received his M.S. degree in Optical Engineering from Beijing University of Technology (2008), and his Ph.D. degree from Institute of Physics, Chinese Academy of Sciences (2012).
From October 2012 to March 2017, he was a special researcher at the Institute of Physical Properties, University of Tokyo, Japan. During his time at the University of Tokyo, he was engaged in research on fibre lasers, Yb:YAG solid-state lasers and nonlinear optical frequency conversion. Oriented towards interferometric lithography, laser processing and other applications, he has achieved innovative results in wavelength generation such as deep UV 258nm and 193nm (10W@258nm.1W@193nm), and his developed solid-state 193nm laser seed has been applied to the prototype prototype of hybrid AF excimer amplifier at Gigaphoton.June 2017 - December 2019 Worked at the University of Hamburg/German Electron Accelerator Centre (DESY), Germany, mainly involved in the Accelerator on Chip (ACHIP) project, responsible for the development of a 2μm ultrafast laser for laser acceleration; also involved in the development and daily operation and maintenance of the European XFEL photocathode laser, the FLASH1 & FLASH2 proto-probe laser. Currently, his main research interests include ultrafast laser technology, high average power deep-vacuum ultraviolet lasers, and high-power/high-energy terahertz radiation generation and transmission.
